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国家自然科学基金(90607017)

作品数:3 被引量:2H指数:1
相关作者:张兴何进张钢刚牛旭东张健更多>>
相关机构:北京大学更多>>
发文基金:国家自然科学基金更多>>
相关领域:电子电信更多>>

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Benchmark tests on symmetry and continuity characteristics between BSIM4 and ULTRA-BULK
2009年
This paper presents the benchmark test results on the symmetry and continuity characteristics between BSIM4 from Berkeley and ULTRA-BULK from Peking University. It is shown that the industry standard model BSIM4 has a series of the shortcomings of the continuity and symmetry, such as the charge, high-order current derivatives, and the trans-capacitances while the latest advanced surface-potential based MOSFET compact model, ULTRA-BULK, demonstrates all necessary continuity and symmetry characteristics, which are very important for analog and RF circuit design.
牛旭东李博宋岩张立宁何进
关键词:CONTINUITYSYMMETRY
FinFET Reliability Study by Forward Gated-Diode Method
Reliability of FinFETs is studied in this paper using the forward gated-diode generation-recombination(G-R) cu...
Chenyue MaBo LiYiqun WeiLining ZhangJin HeXing ZhangXinnan Lin
关键词:FINFETSTRESSDISTRIBUTION
A Complete Surface Potential-Based Core Model for Undoped Symmetric Double-Gate MOSFETs
2008年
A surface potential-based model for undoped symmetric double-gate MOSFETs is derived by solving Poisson's equation to obtain the relationship between the surface potential and voltage in the channel region in a self-consistent way. The drain current expression is then obtained from Pao-Sah's double integral. The model consists of one set of surface potential equations,and the analytic drain current can be evaluated from the surface potential at the source and drain ends. It is demonstrated that the model is valid for all operation regions of the double-gate MOSFETs and without any need for simplification (e. g., by using the charge sheet assumption) or auxiliary fitting functions. The model has been verified by extensive comparisons with 2D numerical simulation under different operation conditions with different geometries. The consistency between the model calculation and numerical simulation demonstrates the accuracy of the model.
何进张立宁张健傅越郑睿张兴
对表面势为基础的MOSFET片电荷模型的基本检验被引量:2
2006年
本文完成了对多种表面势为基础的MOSFET片电荷(charge-sheet)模型反型层电荷和沟道电流计算的基本检验.相对于以基本的MOSFET器件物理为基础的Pao-Sah模型结果,大多数片电荷模型在不同的工作区域内都会出现不同程度的反型层电荷计算误差.为了模拟沟道电流,MOSFET片电荷模型必须使用一个半经验的沟道电流方程.这个近似会导致沟道电流方程和反型层电荷方程之间物理上的不自恰,从而使计算的沟道电流结果与Pao-Sah模型相比有近10%的误差.这些基本的检验结果表明:为了保持基本的MOSFET器件物理内容和Pao-Sah模型的高精度,以表面势为基础的片电荷模型还需要一些根本的器件物理改进和进一步的模型精度提高.
何进牛旭东张钢刚张兴
关键词:MOSFETS器件物理
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