国家重点基础研究发展计划(2006CB302703)
- 作品数：1 被引量：0H指数：0
- 相关作者：孟庆伟付爽胡龙龙范仲勇丁士进更多>>
- 相关机构：复旦大学更多>>
- 发文基金：国家重点基础研究发展计划国家科技重大专项更多>>
- 相关领域：一般工业技术电气工程更多>>
- Physical and optical properties of ZnO thin films grown by DC sputtering deposition
- The effects of the deposition condition of DC sputtering on the properties of ZnO thin films were systematic i...
- Tao ChenShu-Yi LiuChristophe DetavernierR.L.Van MeirhaegheXin-Ping Qu
- Process Characterization for Strained Si on SOI CMOS Devices
- Although the strained-Si channel engineering seems to be rather compatible with the existing mainstream CMOS p...
- Ran Liu
- Development of novel SU-8 based nanoimprint lithography
- We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer a...
- Shen-Qi XieBing-Rui LuJing WanRong YangYifang ChenXin-Ping QuRan Liu
- Improvement of the crystallinity and optical properties of sol-gel ZnO thin film by a PVD ZnO buffer layer
- The effect of the ZnO homo-buffer layer on the structural,optical and electrical properties of the Sol-gel ZnO...
- Shu-Yi LiuTao ChenYu-Long JiangGuo-Ping RuBing-Zong Li and Xin-Ping Qu
- 紫外辐照对超低介电常数SiCOH薄膜组成与机械性能的影响
- 2011年
- 采用紫外光辐照超低介电常数多孔SiCOH薄膜,研究不同照射时间对薄膜结构和性能的影响。采用动态纳米压入技术测量薄膜的力学性能,发现随照射时间增加,薄膜的模量(Er)和硬度(H)不断提高。当辐照时间增至6h时,薄膜力学强度分别达到Er约7.4GPa,H约1.0GPa。傅里叶变换红外光谱(FT-IR)、X射线光电子能谱(XPS)分析表明紫外辐照处理能够使薄膜样品中发生键的断裂与重新结合,从而改变了薄膜骨架的交联密度和刚性,进而提高力学性能。但介电性能并未受到明显影响,紫外辐照6h后,k值仅从2.0增至2.2。
- 付爽胡龙龙孟庆伟丁士进范仲勇
- 关键词：紫外辐照力学性能低介电常数
